盲孔型压砧/Blind Hole Anvil
原料：Ia或IIas
Material：Ia type & IIas type diamond
定制型压砧
Special designed anvil
可用于减少金刚石吸收等极端光学实验
Special designed for extreme optical experiments such as reducing diamond absorption.
Material：Ia type & IIas type diamond
定制型压砧
Special designed anvil
可用于减少金刚石吸收等极端光学实验
Special designed for extreme optical experiments such as reducing diamond absorption.
采用Boehler型金刚石压砧进行挖孔处理，同时进行精细抛光，打孔底部直径最小200μm，打孔深度0-1.5mm，打孔角度11°。可用于减少金刚石吸收等极端光学实验。
Based on boehler type anvil, the light transmission is enhanced by special processing and polishing.The bottom diameter is 200um, the depth is 0-1.5mm and the angle is 11°. Special designed for extreme optical experiments such as reducing diamond absorption.
